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Electron mobilities in In/sub 0. 2/Ga/sub 0. 8/As/GaAs strained-layer superlattices

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.94523· OSTI ID:5557606

We report the first Hall effect and resistivity measurements on strained-layer superlattices (SLS's) in the (In,Ga)As system. The samples, grown by molecular beam epitaxy, had 60 periods of alternating, 120-A-thick In/sub 0.2/Ga/sub 0.8/ As and GaAs layers. Both uniform-doped and modulation-doped structures (with Si donors) were studied. Low-temperature mobilities of over 3 x 10/sup 4/ cm/sup 2//Vs were obtained for structures with doping in only the central 30-A region of each GaAs layer. Our results are comparable to reported results on similar (Al,Ga)As superlattices, confirming that high crystalline quality can be obtained in SLS's with significant mismatch (approx.1.4%) and many interfaces (>100).

Research Organization:
Sandia National Laboratories, Albuquerque, New Mexico 87185
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5557606
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 43:9; ISSN APPLA
Country of Publication:
United States
Language:
English