Ion mixing of metal/Al bilayers near 77 K
Journal Article
·
· Appl. Phys. Lett.; (United States)
The efficiency of interfacial ion mixing is measured for metal/Al (metal = Ti, Cr, Ni, and Mo) thin-film bilayers irradiated with 285 keV Xe/sup +/ ions near 77 K. The results indicate that, as a group, mixing of 3d-metal/Al pairs irradiated by Xe can be explained by neither a pure binary collision cascade nor a pure thermal spike model. Such a situation should exist; that it should be found at the average atomic numbers of the present bilayers is consistent with recent theoretical predictions.
- Research Organization:
- California Institute of Technology, Pasadena, California 91125
- OSTI ID:
- 6569072
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 54:5; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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