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Comment on ''Ion mixing of metal/Al bilayers near 77 K''

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.101864· OSTI ID:5936942
The correct mixing efficiency for the Fe/Al bilayer (900 keV Xe /sup +3/ , 77K) is presented in the context of the recent analysis by Ma, IE.E., Work man, W.L/gt/, Johnson, W.L., and Nicolet, M.A. (AIP)
Research Organization:
Universidade Federal do Rio Grande do Sul, 91500, Porto Alegre, RS, Brazil(BR)
OSTI ID:
5936942
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 55:5; ISSN APPLA
Country of Publication:
United States
Language:
English