Properties of electrolyte and electrode films prepared by rf and dc magnetron sputtering
Conference
·
OSTI ID:6568424
Increased interest in ion conducting thin films and thin-film devices is evidenced by the number of papers on this topic presented at the recent Garmisch conference. Magnetically enhanced (magnetron) sputtering is an important technique for depositing these as well as other kinds of ceramic thin films. Two advantages of magnetron over conventional diode sputtering are the increased sputtering rate, which is important in the deposition of ceramic materials, and the reduction in electron bombardment of the substrate and growing film. In this paper, we describe our high-vacuum film growth chamber and present the results of tests of this system in fabricating films of lithium ion conducting glass electrolytes, TiS/sub 2/, and vanadium oxide by reactive dc and rf magnetron sputtering. The results of combining these films into a thin film lithium battery also are discussed. 22 refs., 1 tab.
- Research Organization:
- Oak Ridge National Lab., TN (USA)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 6568424
- Report Number(s):
- CONF-881155-31; ON: DE89005123
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ALKALI METAL COMPOUNDS
CERAMICS
CHALCOGENIDES
COATINGS
ELECTRICAL PROPERTIES
ELECTROLYTES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ENERGY BEAM DEPOSITION FILMS
EQUIPMENT
FILMS
LITHIUM COMPOUNDS
LITHIUM OXIDES
MAGNETRONS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
RF SYSTEMS
SOLID ELECTROLYTES
SPUTTERING
SULFIDES
SULFUR COMPOUNDS
THIN FILMS
TITANIUM COMPOUNDS
TITANIUM SULFIDES
TRANSITION ELEMENT COMPOUNDS
VANADIUM COMPOUNDS
VANADIUM OXIDES
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ALKALI METAL COMPOUNDS
CERAMICS
CHALCOGENIDES
COATINGS
ELECTRICAL PROPERTIES
ELECTROLYTES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ENERGY BEAM DEPOSITION FILMS
EQUIPMENT
FILMS
LITHIUM COMPOUNDS
LITHIUM OXIDES
MAGNETRONS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
RF SYSTEMS
SOLID ELECTROLYTES
SPUTTERING
SULFIDES
SULFUR COMPOUNDS
THIN FILMS
TITANIUM COMPOUNDS
TITANIUM SULFIDES
TRANSITION ELEMENT COMPOUNDS
VANADIUM COMPOUNDS
VANADIUM OXIDES