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Radiation-hardened MOS device response to high dose rate irradiations as a function of temperature

Conference ·
OSTI ID:6567915

The effect of the device temperature during irradiation at high dose rates has been investigated for transistors and ICs over the MIL-STD temperature range, -55 to 125/degree/C. At low temperatures, large increases in transistor leakage current was observed due to large shifts in the threshold voltages of parasitic field oxide transistors. The response of hardened field oxide devices and their effects on IC performance at high dose rates and low temperatures will be discussed for several different process conditions. 7 refs., 3 figs.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6567915
Report Number(s):
SAND-88-2248C; CONF-890212-2; ON: DE88015258
Country of Publication:
United States
Language:
English