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U.S. Department of Energy
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Thin-film polycrystalline silicon solar cells. Final technical report, 1 October 1979-30 September 1980

Technical Report ·
OSTI ID:6535033

The objectives of this research program were: (1) investigation of a semicontinuous plasma deposition system as a means for efficient, high rate deposition of polycrystalline silicon films; (2) development of low-cost reuseable substrates for deposition and shear separation of the silicon films; (3) optimization of subsequent grain enhancement of the films through RTR laser recrystallization; and (4) demonstration of at least 12% efficient, large area (greater than 10 cm/sup 2/) solar cells fabricated on grain enhanced silicon films. Significant progress was made on all the tasks, and details are presented. Reuseable substrate system studies include characterization of the molybdenum temporary substrates as they are recycled through silicon film deposition-separation cycles, and establishment of the shear separation mechanism. High pressure plasma (HPP) deposition of microcrystalline silicon films is described. The deposition process was characterized by on-line gas chromatographic analysis of the reactor effluent gases under various conditions of substrate temperature, reactant flow rates, and concentrations using the chlorosilanes SiCl/sub 4/, SiHCl/sub 3/ and SiH/sub 2/Cl/sub 2/. A detailed characterization of grain-enhanced silicon films is given. The solar cell fabrication and evaluation effort is described in detail. (WHK)

Research Organization:
Motorola, Inc., Phoenix, AZ (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
6535033
Report Number(s):
SERI/TR-8277-1-T2
Country of Publication:
United States
Language:
English