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Plasma Si nitride: A promising dielectric to achieve high-quality silicon MIS/IL solar cells

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.329058· OSTI ID:6510537
Substantial advantages of plasma Si nitride, for the first time applied to silicon MIS inversion layer (MIS/IL) solar cells, are demonstrated: The highest positive interface charge densities ever used for this type of solar cell (up to 7.2 x 10/sup 12/ cm/sup -2/), absolute stability of the charges up to the nitride despoition temperature (220 and 300 /sup 0/C, respectively), excellent passivation of the entire cell, and good AR coating properties. High uv sensitive MIS/IL solar cells were fabricated with these layers on p--Si (100). AM1 efficiencies of 15% (active area) at 25 /sup 0/C were obtained.
Research Organization:
Institut fuer Werkstoffwissenschaften VI, Universitaet Erlangen-Nuernberg, D-8520 Erlangen, West Germany
OSTI ID:
6510537
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 52:4; ISSN JAPIA
Country of Publication:
United States
Language:
English