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Time dependence of switching oxide traps

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:6488856
;  [1]
  1. Army Research Lab., Adelphi, MD (United States)
Metal-oxide semiconductor field-effect transistors (MOSFETs) were irradiated and then annealed under alternating positive and negative bias. The magnitude of the reversible trapped-oxide charge component decayed over the course of several cycles (of 3 [times] 10[sup 3] s each) in one of two processes studied. The HDL hole trap model is shown to explain these and other recent results.
OSTI ID:
6488856
Report Number(s):
CONF-940726--
Conference Information:
Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Journal Volume: 41:6Pt1
Country of Publication:
United States
Language:
English

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