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Wet chemical passivation of YBa sub 2 Cu sub 3 O sub 7 minus x

Journal Article · · Journal of the Electrochemical Society; (USA)
DOI:https://doi.org/10.1149/1.2086940· OSTI ID:6484243
; ;  [1]
  1. Center for Space Microelectonics Technology, Jet Propulsion Lab., California Inst. of Technology, Pasadena, CA (US)
Wet chemical techniques are described for treatment of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} surfaces, which result in the formation of native compounds known to have little or no reactivity to water. Suitable native compounds include CuI, BaSO{sub 4}, CuS, Cu{sub 2}S, YF{sub 3}, and the oxalates. Formation of surface layers in which these nonreactive native compounds are major constituents is verified with x-ray photoelectron spectroscopy (XPS) measurements on YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} films treated with dilute solutions of HI, H{sub 2}SO{sub 4}, Na{sub 2}S, HF, or H{sub 2}C{sub 2}O{sub 4}. No significant changes are observed in the XPS spectra when the sulfide, sulfate, or oxalate films are dipped in water, while the iodide and fluoride films show evidence of reaction with water. X-ray diffraction measurements show that the superconducting phase is absent in the sulfide film, but is unaffected by the oxalate and sulfate treatments.
OSTI ID:
6484243
Journal Information:
Journal of the Electrochemical Society; (USA), Journal Name: Journal of the Electrochemical Society; (USA) Vol. 137:7; ISSN 0013-4651; ISSN JESOA
Country of Publication:
United States
Language:
English

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