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Wet chemical techniques for passivation of YBa sub 2 Cu sub 3 O sub 7 minus x

Conference · · AIP Conference Proceedings (American Institute of Physics); (USA)
OSTI ID:6793723
; ;  [1]
  1. Center for Space Microelectronics Technology, Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA (USA)

Wet chemical techniques are described for treatment of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} surfaces, resulting in the formation of native compounds with little or no reactivity to water. Promising native compounds include CuI, BaSO{sub 4}, CuS, Cu{sub 2}S, YF{sub 3}, and the oxalates. Formation of surface layers on chemically-treated YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} films in which these nonreactive native compounds are major constituents is verified with x-ray photoelectron spectroscopy (XPS). No significant changes are observed in the spectra when the sulfide, sulfate, or oxalate films are dipped in water, while the iodide and fluoride films show evidence of reaction with water.

OSTI ID:
6793723
Report Number(s):
CONF-891092--
Journal Information:
AIP Conference Proceedings (American Institute of Physics); (USA), Journal Name: AIP Conference Proceedings (American Institute of Physics); (USA) Vol. 199:1; ISSN 0094-243X; ISSN APCPC
Country of Publication:
United States
Language:
English