Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Wet chemical techniques for passivation of YBa sub 2 Cu sub 3 O sub 7 minus x

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.102323· OSTI ID:5373202
; ;  [1]
  1. Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California 91109 (US)
Wet chemical techniques are described for treatment of YBa{sub 2}Cu{sub 3}O{sub 7}{sub {minus}{ital x}} surfaces, resulting in the formation of native compounds with little or no reactivity to water. Promising native compounds include CuI, BaSO{sub 4}, CuS, Cu{sub 2}S, and the oxalates, all of which are either insoluble or have very low solubility in water. Treatment with dilute HI results in the formation of anative iodide film which is 80--90% CuI with small amounts of YI{sub 3} and BaI{sub 2}. Treatment with dilute H{sub 2}SO{sub 4} results in the formation of a film which is 95% BaSO{sub 4} and 5% Y{sub 2}(SO{sub 4}){sub 3}. Cu{sub 2}S is formed on the surface with a dilute Na{sub 2}S solution. An oxalate film with equal amounts of Y{sub 2}(C{sub 2}O{sub 4}){sub 3} and BaC{sub 2}O{sub 4} results from treatment with dilute oxalic acid. X-ray photoelectron spectra show no significant changes when the sulfide, sulfate, or oxalate films are dipped in water, while the iodide film shows evidence of Cu(OH){sub 2} formation.
OSTI ID:
5373202
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 55:17; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English

Similar Records

Wet chemical passivation of YBa sub 2 Cu sub 3 O sub 7 minus x
Journal Article · Sun Jul 01 00:00:00 EDT 1990 · Journal of the Electrochemical Society; (USA) · OSTI ID:6484243

Wet chemical techniques for passivation of YBa sub 2 Cu sub 3 O sub 7 minus x
Conference · Wed Jan 24 23:00:00 EST 1990 · AIP Conference Proceedings (American Institute of Physics); (USA) · OSTI ID:6793723

Reaction of nonaqueous halogen solutions with YBa sub 2 Cu sub 3 O sub 7 minus x
Journal Article · Tue Nov 14 23:00:00 EST 1989 · Journal of Applied Physics; (USA) · OSTI ID:5298093