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Reaction of nonaqueous halogen solutions with YBa sub 2 Cu sub 3 O sub 7 minus x

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.343805· OSTI ID:5298093
; ;  [1]
  1. Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California 91109 (US)
X-ray photoelectron spectroscopy (XPS) has been used to investigate the reaction of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} films with solutions of HF, HCl, Br{sub 2}, HBr, I{sub 2}, and HI in absolute ethanol (EtOH). The XPS core level and x-ray excited Auger spectra from untreated and halogen-treated surfaces are used to identify surface species by comparison with XPS data from the literature and with XPS spectra from more than 20 Y, Ba, and Cu halides, oxides, hydroxides, and carbonates measured in this work. XPS measurements on a number of these materials are being reported for the first time. Treatment of films with HF/EtOH results in the formation of an oxyfluoride with Y:Ba:Cu relative concentrations of 1:4:3. Additional features in the XPS spectra from HF-treated films are also consistent with the formation of CuF, a compound which does not exist in bulk form. Treatment of films with HCl/EtOH results primarily in the formation of BaCl{sub 2} ({similar to}75%), with smaller amounts of YCl{sub 3}, CuCl, and CuCl{sub 2}. Treatment of films with Br{sub 2}/EtOH or HBr/EtOH results in the formation of YBr{sub 3}, BaBr{sub 2}, and CuBr with relative concentrations 1:4:3. YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} films were found to have no discernible reaction with I{sub 2}/EtOH solutions, but treatment of films with HI/EtOH results in the formation of CuI on the surface.
OSTI ID:
5298093
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 66:10; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English