Nonaqueous chemical depth profiling of YBa/sub 2/Cu/sub 3/O/sub 7//sub -//sub x/

Journal Article · Mon Mar 13 04:00:00 EST 1989 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.101425· OSTI ID:6420047

Vasquez, R P; Foote, M C; Hunt, B D

A nonaqueous solution of Br in absolute ethanol (EtOH) has recently been reported (R. P. Vasquez, B. D. Hunt, and M. C. Foote, Appl. Phys. Lett. 53, 2692 (1988)) to be effective at removing nonsuperconducting surface species from YBa/sub 2/ Cu/sub 3/ O/sub 7-//sub x/ films, leaving the surface close to the ideal stoichiometry. This same etchant is shown here to be an effective bulk etchant in chemical depth profiling through 1-..mu..m-thick films. The Cu remains in the 2+oxidation state and the stoichiometry, as determined by x-ray photoelectron spectroscopy, is close to ideal and nearly constant throughout the profile, indicating the absence of any large preferential etching effects. The reaction of YBa/sub 2/ Cu/sub 3/ O/sub 7-//sub x/ films with HF/EtOH, HCl/ EtOH, and I/EtOH solutions is also reported.

• Research Organization: Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California 91109
• OSTI ID: 6420047
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 54:11; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
ALKALINE EARTH METAL COMPOUNDS
BARIUM COMPOUNDS
BARIUM OXIDES
CHALCOGENIDES
CHEMICAL REACTIONS
COPPER COMPOUNDS
COPPER OXIDES
ETCHING
FILMS
OXIDATION
OXIDES
OXYGEN COMPOUNDS
STOICHIOMETRY
SUPERCONDUCTING FILMS
SURFACE FINISHING
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
YTTRIUM COMPOUNDS
YTTRIUM OXIDES