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TiO sub x /Al sub 2 O sub 3 multilayer ceramic thin films

Journal Article · · Journal of the American Ceramic Society; (USA)
; ; ;  [1]
  1. Oak Ridge National Lab., TN (USA). Metals and Ceramics Div.
This paper reports on titanium oxide/aluminum oxide films deposited using molecular beam epitaxy methods and characterized by reflection high-energy electron diffraction and transmission electron microscopy techniques. Growth on silicon substrates below 973 K resulted in primarily amorphous multilayers. At 1323 K, the deposition of titanium in an oxygen atmosphere on (0001) Al{sub 2}O{sub 3} substrates resulted in films of Ti{sub 2}O{sub 3}. These films consisted of small domains, up to 60 nm, slightly misoriented from a (11{bar 2}0) {parallel} (11{bar 2}0) orientation relationship. Two variants of Ti{sub 2}O{sub 3} were observed due to multiple positioning during growth. Closing the titanium shutter during a growth resulted in an oriented TiO{sub 2} film.
DOE Contract Number:
AC05-84OR21400
OSTI ID:
6483788
Journal Information:
Journal of the American Ceramic Society; (USA), Journal Name: Journal of the American Ceramic Society; (USA) Vol. 73:6; ISSN JACTA; ISSN 0002-7820
Country of Publication:
United States
Language:
English