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Excitation of an XeF laser by a microsecond electron beam. [0. 18 J]

Journal Article · · Sov. Phys. - Tech. Phys. (Engl. Transl.); (United States)
OSTI ID:6476381
The XeF laser uses a mixture of Ar, Xe, and SF/sub 6/ and is excited by a discharge stabilized by an electron beam with current density approx.1 A/cm/sup 2/ and pulse length approx.1 ..mu..sec. The volume of the discharge is 1.8 x 3 x 100 cm/sup 3/. An output energy of 0.18 J is obtained using the mixture Ar:Xe:SF/sub 6/=220:1:0.1 at a pressure of 5 atm and a bank voltage of 23 kV.
Research Organization:
Institute of Atmospheric Optics, Siberian Branch, Academy of Sciences of the USSR, Tomsk
OSTI ID:
6476381
Journal Information:
Sov. Phys. - Tech. Phys. (Engl. Transl.); (United States), Journal Name: Sov. Phys. - Tech. Phys. (Engl. Transl.); (United States) Vol. 23:9; ISSN SPTPA
Country of Publication:
United States
Language:
English