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Discharge physics, formation and quenching processes of XeF. Final technical report

Technical Report ·
DOI:https://doi.org/10.2172/5168105· OSTI ID:5168105
Discharge physics and the formation and quenching processes in typical XeF laser mixtures are discussed. We have determined that the discharge physics is dominated by electron impact excitation and ionization of the rare gas metastables. The ionization of the metastables impacts the discharge stability directly while their excitation strongly affects the efficiency of producing XeF*. From our discharge experiments we have determined that Xe/sup +/(6p) states react with NF/sub 3/ to produce XeF* with a branching ratio of 0.7. The rate constant for this reaction is 4 x 10/sup -10/ cm/sup 3//sec. The formation and quenching processes have been determined by analyzing the dependence of (B/sup 2/..sigma../sup +//sub 1/2/ ..-->.. X/sup 3/..sigma../sup +//sub 1/2/) radiation on the partial pressures of Ar, Xe, and F/sub 2/. In the experiments the XeF* was produced by a high energy E-beam. We have determined the two and three body quenching rates by Ar to be 8 +- 4 x 10/sup -13/ cm/sup 3//sec and 1.5 +- 0.5 x 10/sup -32/ cm/sup 6//sec. Xe quenches XeF* with a three body rate of 3 +- 1.5 x 10/sup -31/ cm/sup 6//sec; the third body was mainly argon.
Research Organization:
Avco-Everett Research Lab., Inc., Everett, Mass. (USA)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5168105
Report Number(s):
UCRL-13797
Country of Publication:
United States
Language:
English