Electron-beam-controlled discharge pumping of the XeF laser

Journal Article · Fri Oct 01 04:00:00 EDT 1976 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.89106· OSTI ID:7179586

Mangano, J A; Jacob, J H; Dodge, J B

Laser action of XeF has been obtained in atmospheric-pressure mixtures of 0.1% NF/sub 3/, 0.4% Xe, and 99.5% Ar with electron-beam-controlled discharge pumping. The mean discharge current and voltage were 75 A/cm/sup 2/ and 11 kV/cm, respectively, at 4 atm total pressure. The high-energy E-beam current was 12 A/cm/sup 2/. Mechanisms for creating XeF* in a discharge are discussed. Physical processes which limit the intrinsic efficiency to 0.3% in the present device are also discussed. (AIP)

• Research Organization: Avco Everett Research Laboratory, Inc., 2385 Revere Beach Parkway, Everett, Massachusetts 02149
• OSTI ID: 7179586
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 29:7; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ARGON
BEAMS
BRANCHING RATIO
CHEMICAL REACTION KINETICS
EFFICIENCY
ELECTRIC DISCHARGES
ELECTRON BEAMS
ELEMENTS
EMISSION SPECTRA
ENERGY TRANSFER
FLUORESCENCE
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
KINETICS
LASERS
LEPTON BEAMS
LUMINESCENCE
NITROGEN COMPOUNDS
NITROGEN FLUORIDES
NONMETALS
PARTICLE BEAMS
RARE GAS COMPOUNDS
RARE GASES
REACTION KINETICS
SPECTRA
STABILITY
XENON
XENON COMPOUNDS
XENON FLUORIDES