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Threshold power density measurements for electron-beam sustained discharge excitation of XeF and KrF

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.89604· OSTI ID:7215553
Threshold power densities for electron-beam-stabilized discharge excitation of XeF and KrF lasers are reported for Ar+Kr+F/sub 2/ and Ar+Xe+NF/sub 3/ gas mixtures at 1 atm. Stable discharges were obtained with these gas mixtures for times greater than 0.5 ..mu..sec with lasing pulse width as long as 0.5 ..mu..sec. An analysis of data for several different pump power densities is presented which indicates that the threshold pump power density varies inversely with the cavity buildup time.
Research Organization:
Mathematical Sciences Northwest, Inc., Bellevue, Washington 98009
OSTI ID:
7215553
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 31:2; ISSN APPLA
Country of Publication:
United States
Language:
English