Lasing of XeCl, XeF, and KrF excimer molecules in two-component mixtures
Journal Article
·
· Sov. J. Quant. Electron. (Engl. Transl.); (United States)
Lasing in XeCl, XeF, and KrF excimer molecules in mixtures without a buffer gas was obtained for the first time by pumping with a fast electric discharge. Lasing in XeCl molecules was observed in CCl/sub 4/:Xe = 1:(400--4000) mixtures at pressures of 0.1--0.55 atm.
- Research Organization:
- T. G. Shevchenko State University, Kiev
- OSTI ID:
- 5618226
- Journal Information:
- Sov. J. Quant. Electron. (Engl. Transl.); (United States), Journal Name: Sov. J. Quant. Electron. (Engl. Transl.); (United States) Vol. 15:3; ISSN SJQEA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
CHLORIDES
CHLORINE COMPOUNDS
EMISSION SPECTRA
EXCIMER LASERS
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
KRYPTON COMPOUNDS
KRYPTON FLUORIDES
LASERS
RARE GAS COMPOUNDS
SPECTRA
XENON CHLORIDES
XENON COMPOUNDS
XENON FLUORIDES
420300* -- Engineering-- Lasers-- (-1989)
CHLORIDES
CHLORINE COMPOUNDS
EMISSION SPECTRA
EXCIMER LASERS
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
KRYPTON COMPOUNDS
KRYPTON FLUORIDES
LASERS
RARE GAS COMPOUNDS
SPECTRA
XENON CHLORIDES
XENON COMPOUNDS
XENON FLUORIDES