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Orientation filtering by growth-velocity competition in zone-melting recrystallization of silicon on SiO/sub 2/

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.94255· OSTI ID:6460558
We describe a method of controlling the in-plane <100> directions of grains in (100)-textured silicon films produced by zone-melting recrystallization over amorphous SiO/sub 2/. Grains having in-plane orientation within a narrow range are able to grow through an orientation filter consisting of a pattern of crystallization barriers, while grains having other orientations are occluded. The results of experiments using an orientation filter, and the parameters which optimize filter performance, are reported.
Research Organization:
Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
OSTI ID:
6460558
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 43:12; ISSN APPLA
Country of Publication:
United States
Language:
English