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New vacancy-related defects in n-type silicon

Journal Article · · Phys. Rev. B: Condens. Matter; (United States)
Using deep-level transient capacitance spectroscopy, four dominant vacancy-related defects are found to be produced by room-temperature 2.5-MeV electron irradiation of n-type (p phosphorus concentration approx.10/sup 16/ cm/sup -3/) floating-zone silicon. This is in contradiction to the simple accepted model of vacancy trapping to produce predominantly oxygen- and phosphorus-vacancy pairs. We observe the oxygen-vacancy pair, but we now have two candidates for the phosphorus-vacancy pair. One of these displays properties suggestive of configurational metastability with four distinct configurations. We suggest that the remaining defect could be a vacancy-unknown impurity pair (carbon .) or possibly the isolated lattice vacancy in a new, more stable configuration.
Research Organization:
Department of Physics and Sherman Fairchild Laboratory, Lehigh University, Bethlehem, Pennsylvania 18015
OSTI ID:
6446293
Journal Information:
Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 33:2; ISSN PRBMD
Country of Publication:
United States
Language:
English

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