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Preparation of silicon substrates for gallium arsenide solar cells. Semiannual report, February 1983-September 1983

Technical Report ·
OSTI ID:6415821
This report describes a process and structure for the fabrication of high-efficiency GaAs-GaAlAs heteroface solar cells. A GaAs-GaAlAs solar cell with AMl efficiency greater than 20% has been fabricated on a single-crystal GaAs substrate, and a GaAs-GaAlAs solar cell showing high open-circuit voltage has been fabricated on a single-crystal bulk-Ge substrate. Films of GaAs grown on Ge-coated Si substrates have been measured and shown to have 10/sup 16/ defects/cm/sup 2/. Smooth, single-crystal films of GaAs have also been deposited directly on bare Si substrates. These films on bare Si have been measured and shown to have 5 x 10/sup 6/ defects/cm/sup 2/.
Research Organization:
Spire Corp., Bedford, MA (USA)
DOE Contract Number:
AC02-83CH10093
OSTI ID:
6415821
Report Number(s):
SERI/STR-211-2506; ON: DE85000521
Country of Publication:
United States
Language:
English