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U.S. Department of Energy
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Gallium arsenide and multibandgap solar cell research: Final subcontract report, April 1984-April 1986

Technical Report ·
DOI:https://doi.org/10.2172/6269267· OSTI ID:6269267
This report presents results of research in high-efficiency, low-cost solar cells, emphasizing heteroepitaxial growth of a III-V compound material onto a single-crystal silicon wafer. The report describes the start-up and characterization of a new metal-organic vapor deposition (MOCVD) reactor for the growth of GaAs, GaAlAs, and GaAsP on 2-in.-diameter substrates with excellent uniformity; optimization of the growth of Ge films on Si by a simple CVD technique; and production of a 9% efficient GaAs-on-Ge-on-Si solar cell. The advancements in the understanding of the GaAs-on-Si growth process and in the quality of the films are described. The work also included production of a 7% efficient GaAs-on-Si cell; development of a GaAsP-on-GaAs growth technology; production of a 16.5% efficient GaAsP cell and a 17.7% efficient GaAlAs cell on GaAs; and production of a 20.8% efficient GaAs-on-GaAs cell. Also described are improvements in cell processing technologies, including the use of a double-layer antireflection coating.
Research Organization:
Spire Corp., Bedford, MA (USA); Solar Energy Research Inst., Golden, CO (USA)
DOE Contract Number:
AC02-83CH10093
OSTI ID:
6269267
Report Number(s):
SERI/STR-211-3188; ON: DE87012260
Country of Publication:
United States
Language:
English