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High-efficiency thin-film GaAs solar cells: Phase II. Final report

Technical Report ·
DOI:https://doi.org/10.2172/6603182· OSTI ID:6603182
The feasibility of producing high-efficiency (15% or greater) thin-film gallium arsenide (GaAs) solar cells with costs suitable for terrestrial power generation was demonstrated by growing thin epi-GaAs films on suitably prepared low-cost substrates to replace the expensive single-crystal GaAs wafers used conventionally. These substrates are made of either recrystallized-Ge films previously deposited on metal substrates of epi-Ge films grown by cheimcal vapor deposition (CVD) on low-cost, low-grade single-crystal Si substrates. Thin GaAs epi layers with good crystallographic quality having been grown using a (100) Si-substrate on which a thin Ge epi-interlayer has first been grown by CVD from germane. Both anti-reflection coated metal oxide-semiconductor (AMOS) and n/sup +//p homojunction structures were studied. AMOS cells were fabricated on undoped-GaAs epi-layers deposited on bulk poly-Ge substrates using organo-metallic CVD film-growth, with the best achieved AMl conversion efficiency being 9.1%. Both p-type and n/sup +/-type GaAs growth have been optimized using 50 ppM dimethyl zinc and 1% hydrogen sulfide, respectively. A new direct GaAs deposition method in fabricating ultra-thin top layer, epitaxial n/sup +//p shallow homojunction solar cells on (100) GaAs substrates (without anodic thinning) was developed to produce large area (1 cm/sup 2/) cells, with 19.4% AMl conversion efficiency achieved. Additional, an AMl conversion efficiency of 18.4% (17.5% with 5% grid coverage) was achieved for a single-crystal GaAs n/sup +//p cell grown by OM-CVD on a Ge wafer.
Research Organization:
Jet Propulsion Lab., Pasadena, CA (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
6603182
Report Number(s):
JPL-PUB-81-33
Country of Publication:
United States
Language:
English