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U.S. Department of Energy
Office of Scientific and Technical Information

Radiation-tolerant, sidewall-hardened SOI/MOS transistors

Conference ·
OSTI ID:6414397

The effects of total-dose radiation have been investigated for sidewall-hardened n-channel MOS transistors fabricated in zone-melt recrystallized (ZMR) and oxygen-implanted SOI films. Subthreshold leakage currents and threshold voltage shifts remained acceptably low for the superior ZMR devices at doses greater than 1 Mrad (SiO/sub 2/).

Research Organization:
Sandia National Labs., Albuquerque, NM (USA); Bell Labs., Murray Hill, NJ (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6414397
Report Number(s):
SAND-87-0220C; CONF-870724-13; ON: DE87006716
Country of Publication:
United States
Language:
English