Microstructure of molybdenum disilicide-silicon carbide nanocomposite thin films

Journal Article · Mon Jun 01 04:00:00 EDT 1998 · Journal of the American Ceramic Society

DOI:https://doi.org/10.1111/j.1151-2916.1998.tb02505.x· OSTI ID:638376

Aldrich, D J; Jones, K M ^[1]; Govindarajan, S; Moore, J J; Ohno, T R ^[2]

---

1. National Renewable Energy Lag., Golden, CO (United States)
2. Colorado School of Mines, Golden, CO (United States)

Composite thin films of molybdenum disilicide-silicon carbide (MoSi{sub 2}-SiC) have been deposited via rf magnetron sputtering onto molybdenum substrates. An intermediate layer was deposited in the presence of nitrogen gas and evaluated as a potential diffusion barrier layer. The composite films have been characterized using X-ray diffractometry, scanning electron microscopy, transmission electron microscopy and Auger electron spectroscopy. The as-deposited films were amorphous but crystallized into nanometer-sized grains after annealing under vacuum at 1,000 C for 30 min. There was a significant amount of interdiffusion between the film and substrate, which resulted in the formation of subsilicides such as Mo{sub 5}Si{sub 3} and MoSi{sub 3}, as well as Mo{sub 2}C. The films that were deposited via reactive sputtering in a nitrogen ambient were amorphous in both the as-deposited and annealed conditions. Significantly fewer second phases were detected with the presence of the intermediate layer, which suggests the potential use of the nitrided (MoSi{sub x}N{sub y}C{sub z}) layer as a high-temperature diffusion barrier layer for the silicon and carbon.

• Sponsoring Organization: USDOE
• OSTI ID: 638376
• Journal Information: Journal of the American Ceramic Society, Journal Name: Journal of the American Ceramic Society Journal Issue: 6 Vol. 81; ISSN 0002-7820; ISSN JACTAW
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AMORPHOUS STATE
COMPOSITE MATERIALS
ELECTRON MICROSCOPY
MICROSTRUCTURE
MOLYBDENUM SILICIDES
SILICON CARBIDES
SPUTTERING
THIN FILMS
X-RAY DIFFRACTION