Microstructure and mechanical properties of nitrided molybdenum silicide coatings
Conference
·
OSTI ID:10120465
- Technical Research Centre of Finland, Espoo (Finland)
- Helsinki Univ. (Finland)
- Los Alamos National Lab., NM (United States)
Mo-Si-N films with a high nitrogen concentration were produced by sputter-deposition in nitrogen plasma. Chemical composition was determined with Rutherford backscattering and nuclear reaction analysis. Ratio of Mo to Si was 1:2 in the coatings with a nitrogen concentration of 50%. Microstructure of the as-deposited coatings on a silicon substrate was amorphous and no crystallization was found after annealing up to 1000{degree}C, although some relaxation was observed in X-ray diffraction. This was confirmed by high-resolution TEM. Hardness of Mo-Si-N films was 18.8 GPa as determined with a nanoindenter. This is significantly higher than that of MoSi{sub 2} films, 11.2 GPa. Hardness of the Mo-Si-N films increased to 24.4 GPa after annealing at 800{degree}C, which is the same as that of the tetragonal phase of MoSi{sub 2}, 25.5 GPa. Similarly, modulus of as-deposited Mo-Si-N film was higher (257 GPa) than that of MoSi{sub 2} film (222 GPa). However, only a slight increase in the modulus of the Mo-Si-N film was found after annealing at 800C, whereas the modulus of the crystallized tetragonal MoSi{sub 2} was 382 GPa. No cracking was found in the Mo-Si-N films even after annealing at 1000C.
- Research Organization:
- Los Alamos National Lab., NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 10120465
- Report Number(s):
- LA-UR--94-308; CONF-931108--66; ON: DE94006249
- Country of Publication:
- United States
- Language:
- English
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