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Preferential sputtering of Ta/sub 2/O/sub 5/ by argon ions

Journal Article · · J. Vac. Sci. Technol.; (United States)
DOI:https://doi.org/10.1116/1.570088· OSTI ID:6352491
X-ray photoelectron spectroscopy has been used to show that Ar/sup +/ preferentially sputters O from the surface to Ta/sub 2/O/sub 5/. In addition, x-ray photoelectron, Auger electron, ion scattering, and secondary ion mass spectroscopies were used to show that more reduction of Ta/sub 2/O/sub 5/ is caused by 0.5 keV Ar/sup +/ than by 5 keV Ar/sup +/. This dependence of preferred sputtering upon energy is attributed to changes in the sputtering mechanisms.
Research Organization:
Sandia Laboratories, Albuquerque, New Mexico 87115
OSTI ID:
6352491
Journal Information:
J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 16:2; ISSN JVSTA
Country of Publication:
United States
Language:
English