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Ion-implanted laser-annealed GaAs solar cells

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.90671· OSTI ID:6346147
Conversion efficiencies up to 12% at AM1 have been obtained for ion-implanted laser-annealed (IILA) GaAs solar cells utilizing a shallow-homojunction n/sup +//p/p/sup +/ structure without a GaAlAs window. The n/sup +/ layer was formed by Se/sup +/-ion implantation into the p layer, which was grown epitaxially by chemical vapor deposition on a single-crystal p/sup +/ substrate. The implanted layer was annealed, without encapsulation, by scanning with a cw Nd : YAG laser. Cell metallization was performed by electroplating, and an antireflection coating was formed by anodic oxidation of the n/sup +/ layer.
Research Organization:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173
OSTI ID:
6346147
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 34:11; ISSN APPLA
Country of Publication:
United States
Language:
English