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Monte Carlo simulation of fast secondary electron production in electron beam resists

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.329366· OSTI ID:6293833
; ;
Monte Carlo calculations of fast secondary electron production have been performed with a hybrid model for the discrete and continuous energy-loss processes. The Moller theory was adopted for the differential inelastic scattering cross-section which determines the production rate of fast secondary electrons. The calculations were made for both a bulk polymethyl methacrylate (PMMA) sample and 4000-A-thin films of PMMA (with and without a silicon substrate) at 10 and 20 keV. The new model is discussed and comparison made with results obtained from the old model, which is based on the continuous slowing down approximation of Bethe for energy loss and the screened Rutherford equation for elastic angular scattering. The new model predicts a larger absorbed energy density than the old model for an isolated line source exposure on a resist film. The consequences of this fast secondary electron contribution on the ultimate limit in electron lithography is discussed.
Research Organization:
IBM Research Laboratory, San Jose, California 95193
OSTI ID:
6293833
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 52:7; ISSN JAPIA
Country of Publication:
United States
Language:
English

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Related Subjects

640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ANGULAR DISTRIBUTION
BEAMS
CARBOXYLIC ACID SALTS
COATINGS
COLLISIONS
COMPARATIVE EVALUATIONS
COMPUTERIZED SIMULATION
CROSS SECTIONS
DISTRIBUTION
ELASTIC SCATTERING
ELECTRON BEAMS
ELECTRON COLLISIONS
ELEMENTS
EMISSION
ENERGY LOSSES
FILMS
INELASTIC SCATTERING
LEPTON BEAMS
LOSSES
MATHEMATICAL MODELS
METHACRYLATES
MONTE CARLO METHOD
PARTICLE BEAMS
POLYMERS
RUTHERFORD SCATTERING
SCATTERING
SECONDARY EMISSION
SEMIMETALS
SILICON
SIMULATION
SURFACES