Energy dissipation by electron beam scattering in thin polymer films. Technical report. [5 to 20 keV: Monte Carlo calculations, multiple- and plural-scattering models]
Monte Carlo calculations have been performed to determine the spatial distribution of energy dissipated in a 4000-A-thick film of polymethyl methacrylate (PMMA), due to an incident electron beam. The calculations were performed for 5-, 10-, and 20-keV electrons on a silicon substrate and also for 20-keV electrons on copper and gold substrates. The effect of varying the beam diameter from 250 to 3000 A is evaluated. A detailed comparison is made between the Monte Carlo results and analytic models used to predict the energy dissipated. The plural-scattering model is found to be in good agreement with the Monte Carlo calculations, whereas discrepancies are found with the multiple-scattering model. The large-angle backscattering model is found to have several important limitations. Energy dissipation is calculated for the exposure of dots, isolated lines, and arrays of closely spaced lines:geometries that are of significance in electron beam lithography.
- Research Organization:
- Massachusetts Inst. of Tech., Lexington (USA). Lincoln Lab.
- OSTI ID:
- 7354446
- Report Number(s):
- AD/A-007061
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
Shielding Calculations & Experiments
73 NUCLEAR PHYSICS AND RADIATION PHYSICS
BEAMS
CHARGED-PARTICLE TRANSPORT
DISTRIBUTION
ELECTRON BEAMS
ELECTRONS
ELEMENTARY PARTICLES
ENERGY LOSSES
ENERGY RANGE
ENERGY TRANSFER
ESTERS
FERMIONS
FILMS
KEV RANGE
KEV RANGE 01-10
KEV RANGE 10-100
LEPTON BEAMS
LEPTONS
LITHOLOGY
MONTE CARLO METHOD
MULTIPLE SCATTERING
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PARTICLE BEAMS
POLYACRYLATES
POLYMERS
POLYVINYLS
RADIATION TRANSPORT
SCATTERING
SPATIAL DISTRIBUTION