Studies of metallic species and oxygen incorporation during sputter-deposition of SrBi{sub 2}Ta{sub 2}O{sub 9} films, using mass spectroscopy of recoiled ions
- Materials Science and Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois60439 (United States)
- Materials Science Division, Argonne National Laboratory, Argonne, Illinois60439 (United States)
- Materials and Nuclear Engineering Department, University of Maryland, College Park, Maryland 20742 (United States)
- Materials Science Department, Northwestern University, Evanston, Illinois 60208 (United States)
We have recently developed a mass spectroscopy of recoiled ions technique which is suitable for monolayer-specific surface analysis of thin films during growth. We present initial results using this technique to study the effect of different bottom electrode layers on metallic species and oxygen incorporation in the early stages of SrBi{sub 2}Ta{sub 2}O{sub 3} (SBT) film growth via ion beam-sputter deposition. The work discussed here has been focused on studying the incorporation of Sr, Bi, and Ta during growth of SBT on Pt/Ti/SiO{sub 2}/Si, Pt/MgO, Ti, and Si substrates. We found that the incorporation of Bi in sputter-deposited SBT films depends critically on the bottom electrode surface composition and the growth temperature. {copyright} {ital 1998 American Institute of Physics.}
- OSTI ID:
- 627885
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 20 Vol. 72; ISSN 0003-6951; ISSN APPLAB
- Country of Publication:
- United States
- Language:
- English
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