Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Epitaxial Ge/GaAs heterostructures by scanned cw laser annealing of a-Ge layers on GaAs

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.92690· OSTI ID:6271726

Expitaxial Ge/GaAs heterostructures have been produced by scanned cw argon laser annealing of 440-nm-thick amorphous Ge films on (100) semi-insulating GaAs substrates. Depending on the incident laser power and scan rate, two modes of film regrowth were observed. At low powers (between approx.1.6 and 4.0 W for a beam diameter of approx.40..mu..m) and scan rates between 1 and 400 cm/sec, polycrystalline Ge with a (100) preferred orientation was formed by an ''explosive'' crystallization mechanism. At higher powers, and over a scan rate range of 20--400 cm/sec, single-crystal films containing some dissolved GaAs in solution were obtained by liquid phase regrowth. Typical film resistivities rho were as follows: as-deposited, rho = 180 ..cap omega.. cm; polycrystalline films, rho = 3 x 10/sup -2/ cm; single-crystal films, rho = 9 x 10/sup -4/..cap omega.. cm.

Research Organization:
Departments of Metallurgy, the Coordinated Science Laboratory and the Materials Research Laboratory, University of Illinois, Urbana, Illinois 61810
OSTI ID:
6271726
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 39:3; ISSN APPLA
Country of Publication:
United States
Language:
English