Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Total-dose hardness assurance issues for SOI MOSFETs

Conference · · IEEE Trans. Nucl. Sci.; (United States)
OSTI ID:6268222

The top-gate, back-gate, and sidewall response of SIMOX and ZMR SOI/MOS transistors to 10 keV x-ray and Co-60 irradiation is compared. For top-gate and sidewall insulators, Co-60 and 10-keV x-ray irradiations at matched dose rates lead to nearly identical response. Back-gate response, on the other hand, depends strongly on radiation energy and buried insulator thickness. Differences are observed of up to 60 percent for SIMOX (0.4 ..mu..m buried oxide), and up to 300 percent for ZMR (2.0 ..mu..m buried oxide), with Co-60 leading to increased response. Different x-ray to Co-60 correlation factors may be observed for other technologies with different sidewall and buried insulator materials and thicknesses. The authors demonstrate that it is not possible to define a generic set of worst-case radiation bias conditions for all SOI technologies. For these devices, it is shown that back-gate radiation response can be a strong function of transistor drain bias during exposure.

Research Organization:
Sandia National Labs., Albuquerque, NM (US)
OSTI ID:
6268222
Report Number(s):
CONF-880730-
Journal Information:
IEEE Trans. Nucl. Sci.; (United States), Journal Name: IEEE Trans. Nucl. Sci.; (United States) Vol. 35:6; ISSN IETNA
Country of Publication:
United States
Language:
English

Similar Records

Test structures for total dose testing of SOI (silicon-on-insulator) mosfets
Conference · Thu Dec 31 23:00:00 EST 1987 · OSTI ID:5019763

Evaluation of silicon-on-insulator MOS (metal-oxide-semiconductor) transistor response to 10-keV x-ray and cobalt-60 irradiation
Conference · Thu Dec 31 23:00:00 EST 1987 · OSTI ID:7145666

Radiation-tolerant, sidewall-hardened SOI/MOS transistors
Conference · Mon Nov 30 23:00:00 EST 1987 · IEEE Trans. Nucl. Sci.; (United States) · OSTI ID:7248179