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Title: New current injection 1. 5-. mu. m wavelength Ga/sub x/Al/sub y/In/sub 1-x/-yAs/InP double-heterostructure laser grown by molecular beam epitaxy

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.93801· OSTI ID:6224168

We have prepared and characterized for the first time a new current injection double-heterostructure (DH) laser with Ga/sub x/Al/sub y/In/sub 1-x/-y As as the active layer and InP as the cladding layers operating at 1.5-..mu..m wavelength. In this new heterostructure, there is only one group V element involved in every layer. This eases the precise control of lattice matching during molecular beam epitaxial (MBE) growth. At the same time, it eliminates the use of Al/sub 0.48/In/sub 0.52/ As, which is of lower quality than InP when grown by MBE, as the cladding layers. Broad-area Fabry--Perot diodes of 380 x 200 ..mu..m have a threshold current density of approx.3.2 kA/cm/sup 2/ for active layer thickness of 0.25 ..mu..m. In the temperature range approx.15--50 /sup 0/C, the threshold temperature dependence coefficient T/sub 0/ is typically approx.40 K. Above approx.50 /sup 0/C, T/sub 0/ decreases to approx.25--35 K. The present laser also represents the first current injection DH laser emitting at 1.5 ..mu..m ever prepared by MBE. In the present experiment, As/sub 2/ instead of As/sub 4/ was also used for the first time in growing the Ga/sub x/Al/sub y/In/sub 1-x/-y As layers by MBE in order to improve their quality. This becomes particularly important as the substrate growth temperatures employed are relatively low, < or approx. =625 /sup 0/C.

Research Organization:
Bell Laboratories, Murray Hill, New Jersey 07974
OSTI ID:
6224168
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 42:11
Country of Publication:
United States
Language:
English

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