Development of ECR sheet plasma source for ion-enhanced reactive sputter deposition
Conference
·
OSTI ID:621338
- Toyama Prefectural Univ., Hyogo (Japan); and others
An ECR plasma source is developed to generate rectilinearly uniform plasmas 20 cm in width. The source consists of a pair of permanent magnets and a slot antenna (slotted waveguide). The poles of the magnets face oppositely each other and a line cusp field is generated in a vacuum chamber. The antenna is set in between the magnets. Uniform O{sub 2} plasmas are obtained in the range of 20 cm. The source is combined with a magnetron sputtering cathode and applies to ion-enhanced reactive sputtering deposition. Films of TiO{sub 2} are deposited for optical coatings. Refractive index of 2.5 is obtained by reactive sputtering in the oxygen ECR plasma. The deposition rate increased by a factor of four with O{sub 2}/Ar mixing gas.
- OSTI ID:
- 621338
- Report Number(s):
- CONF-9606110--
- Country of Publication:
- United States
- Language:
- English
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