Synthesis of tantalum-oxide thin film with reactive DC-magnetron sputtering in electron-cyclotron-resonance (ECR) excited Ar+O{sub 2} plasma
Conference
·
OSTI ID:223672
- Yamanashi Univ. (Japan); and others
In oxygen plasmas excited with the electron cyclotron resonance (ECR), oriented thin films of Ta{sub 2}O{sub 5} have been successfully deposited on quartz substrates above T{sub sub} = 450{degrees}C with the reactive DC magnetron sputtering. The effects of experimental conditions -- the partial pressure of oxygen and the substrate temperature -- have been examined on the deposition rate and the X-ray diffraction characteristics of deposited films.
- Research Organization:
- International Union of Pure and Applied Chemistry; American Physical Society, New York, NY (United States)
- OSTI ID:
- 223672
- Report Number(s):
- CONF-950875--Vol.4
- Country of Publication:
- United States
- Language:
- English
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