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Title: Low-temperature chemical-vapor deposition of tungsten from tungsten hexacarbonyl

Conference ·
DOI:https://doi.org/10.1116/1.571599· OSTI ID:6156111

Chemical vapor deposition (CVD) of tungsten from W(CO)/sub 6/ has been investigated below 670/sup 0/K as an alternate process to WF/sub 6/ CVD for coating glass microspheres. The major advantages of W(CO)/sub 6/ CVD are the elimination of the HF damage to the glass microspheres and potentially a lower deposition temperature for coating DT-filled microspheres. W(CO)/sub 6/ CVD can be utilized, in principle, to coat the microspheres with 1 to 5 ..mu..m of tungsten or to flash coat the microspheres for further coating by WF/sub 6/ CVD. Test coatings were deposited in a fluidized-bed reactor with a hydrogen carrier gas. The coatings were found to contain nearly-equal portions of carbon and oxygen, ranging from 16 to 25 at. % for each element. The high carbon and oxygen concentrations are believed to result principally from the physical entrapment of chemisorbed CO molecules at the surface of the growing deposit.

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
6156111
Report Number(s):
LA-UR-81-2681; CONF-811113-19; ON: DE82000583
Resource Relation:
Journal Volume: 20; Journal Issue: 4; Conference: American Vacuum Society national symposium, Anaheim, CA, USA, 3 Nov 1981
Country of Publication:
United States
Language:
English