Low-temperature chemical-vapor deposition of tungsten from tungsten hexacarbonyl

Conference · Thu Jan 01 04:00:00 EST 1981

DOI:https://doi.org/10.1116/1.571599· OSTI ID:6156111

Vogt, G J

Chemical vapor deposition (CVD) of tungsten from W(CO)/sub 6/ has been investigated below 670/sup 0/K as an alternate process to WF/sub 6/ CVD for coating glass microspheres. The major advantages of W(CO)/sub 6/ CVD are the elimination of the HF damage to the glass microspheres and potentially a lower deposition temperature for coating DT-filled microspheres. W(CO)/sub 6/ CVD can be utilized, in principle, to coat the microspheres with 1 to 5 ..mu..m of tungsten or to flash coat the microspheres for further coating by WF/sub 6/ CVD. Test coatings were deposited in a fluidized-bed reactor with a hydrogen carrier gas. The coatings were found to contain nearly-equal portions of carbon and oxygen, ranging from 16 to 25 at. % for each element. The high carbon and oxygen concentrations are believed to result principally from the physical entrapment of chemisorbed CO molecules at the surface of the growing deposit.

• Research Organization: Los Alamos National Lab., NM (USA)
• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 6156111
• Report Number(s): LA-UR-81-2681; CONF-811113-19; ON: DE82000583
• Country of Publication: United States
• Language: English

Related Subjects

060201* -- Fusion Fuels-- Fabrication & Testing-- (1980-1987)
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CARBON COMPOUNDS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COATINGS
DEPOSITION
DEUTERIUM COMPOUNDS
DEUTERIUM TRITIDES
ELEMENTS
FUELS
GLASS
HYDROGEN COMPOUNDS
LABELLED COMPOUNDS
METALS
MICROSPHERES
REFRACTORY METALS
SURFACE COATING
THERMONUCLEAR FUELS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TRITIUM COMPOUNDS
TUNGSTEN
TUNGSTEN COMPOUNDS