Low-temperature chemical vapor deposition of tungsten from tungsten hexacarbonyl
Chemical vapor deposition (CVD) of tungsten from W(CO)/sub 6/ has been investigated below 670 K as an alternate process to WF/sub 6/ CVD for coating glass microspheres. The major advantages of W(CO)/sub 6/ CVD are the elimination of the HF damage to the glass microspheres and potentially a lower deposition temperature for coating DT-filled microspheres. W(CO)/sub 6/ CVD can be utilized, in principle, to coat the microspheres with 1 to 5 ..mu..m of tungsten or to flash coat the microspheres for further coating by WF/sub 6/ CVD. Test coatings were deposited in a fluidized-bed reactor with a hydrogen carrier gas. The coatings were found to contain nearly equal portions of carbon and oxygen, ranging from 16 to 25 at.% for each element. The high carbon and oxygen concentrations are believed to result principally from the physical entrapment of chemisorbed CO molecules at the surface of the growing deposit. The general quality and adhesion of the W(CO)/sub 6/-derived coatings are unsatisfactory at this time for ICF applications.
- Research Organization:
- Los Alamos National Laboratory, Group CMB-6, Mail Stop 770, Los Alamos, New Mexico 87545
- DOE Contract Number:
- W-7405-ENG-26
- OSTI ID:
- 5648521
- Journal Information:
- J. Vac. Sci. Technol.; (United States), Vol. 20:4
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
GLASS
VAPOR DEPOSITED COATINGS
MICROSPHERES
TUNGSTEN
ADHESION
CHEMICAL VAPOR DEPOSITION
CARBON MONOXIDE
CARBONYL RADICALS
CHEMISORPTION
HIGH TEMPERATURE
HYDROGEN
INERTIAL CONFINEMENT
LASER TARGETS
OXYGEN
TUNGSTEN COMPOUNDS
CARBON COMPOUNDS
CARBON OXIDES
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL REACTIONS
COATINGS
CONFINEMENT
DEPOSITION
ELEMENTS
METALS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PLASMA CONFINEMENT
RADICALS
SEPARATION PROCESSES
SORPTION
SURFACE COATING
TARGETS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
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