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Studies of chemical vapor deposition of amorphous silicon and transparent electrodes for solar cells. I. Technical status report, 1 October 1983-31 December 1983

Technical Report ·
OSTI ID:6133365
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This paper is the first in a series reporting research on chemical vapor deposition (CVD) of amorphous silicon and transparent electrodes for solar cells. Films of a-SiH were deposited by CVD from a mixture of higher silanes and hydrogen at atmospheric pressure on various substrates. Roughening of a crystalline silicon substrate produced somewhat better adhesion than previously obtained. Optical absorption characteristics of the films were measured. A surface photovoltage (SPV) measurement apparatus was developed and is described.
Research Organization:
Harvard Univ., Cambridge, MA (USA)
DOE Contract Number:
AC02-83CH10093
OSTI ID:
6133365
Report Number(s):
SERI/STR-211-2447; ON: DE85002903
Country of Publication:
United States
Language:
English

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Related Subjects

14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
ABSORPTION
AMORPHOUS STATE
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
DIFFUSION LENGTH
DIMENSIONS
DIRECT ENERGY CONVERTERS
ELECTRIC CONTACTS
ELECTRICAL EQUIPMENT
ELEMENTS
EQUIPMENT
HYDRIDES
HYDROGEN COMPOUNDS
IMPURITIES
LENGTH
NITRIDES
NITROGEN COMPOUNDS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PNICTIDES
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SILICON SOLAR CELLS
SOLAR CELLS
SOLAR EQUIPMENT
SURFACE COATING
TIN COMPOUNDS
TIN OXIDES
TITANIUM COMPOUNDS
TITANIUM NITRIDES
TRANSITION ELEMENT COMPOUNDS