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Scanning tunneling microscopy of copper electrodeposited in the presence of benzotriazole

Conference ·
OSTI ID:6117145
;

In the present work, the effects of benzotriazole (BTA) on the topography of Cu deposited on a Pt <111> single crystal surface under potential control was investigated with STM. The surfaces of the Cu deposits were continuously scanned with the tunneling probe during deposition. In the presence of BTA the initial monolayer of Cu was detected. 4 refs., 2 figs.

Research Organization:
Lawrence Berkeley Lab., CA (USA)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6117145
Report Number(s):
LBL-26508; CONF-890518-1; ON: DE89007497
Country of Publication:
United States
Language:
English

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Related Subjects

36 MATERIALS SCIENCE
360101 -- Metals &amp; Alloys-- Preparation &amp; Fabrication
360102* -- Metals &amp; Alloys-- Structure &amp; Phase Studies
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400400 -- Electrochemistry
AZOLES
COPPER
CRYSTAL STRUCTURE
DEPOSITION
ELECTRODEPOSITION
ELECTROLYSIS
ELEMENTS
HETEROCYCLIC COMPOUNDS
LYSIS
METALS
MICROSCOPY
MICROSTRUCTURE
ORGANIC COMPOUNDS
ORGANIC NITROGEN COMPOUNDS
PLATINUM
PLATINUM METALS
SURFACE COATING
TRANSITION ELEMENTS
TRIAZOLES