BTA inhibition mechanism on clean Cu(110) surface by ultraviolet photoemission spectroscopy (UPS) and scanning tunneling microscope (STM)
- Yeungnam Univ., Kyungsan (Korea, Republic of)
- Seoul National Univ. (Korea, Republic of)
- Tohoku Univ., Sendai (Japan). Inst. for Materials Research
Adsorption and film growth of the Benzotriazole (BTA) on a copper (110) surface were investigated by the angle-resolved ultra-violet photoemission (UPS), and scanning tunneling microscope (STM). Coverage dependence of the BTA adsorbed structure on the Cu (110) surface exhibited well-ordered c(4 x 2)structure by STM image and sharp low-energy electron diffraction (LEED) pattern. Further deposition of BTA on monolayer film, polymerized BTA images were observed while a sharp LEED pattern changed to a c(4 x 2). In a good agreement with STM results, UPS spectra of BTA film by coverage dependence showed that BTA adsorbed flat up to 1 monolayer (ML), followed by stand-up polymerization above 1 monolayer. It is also suggested that 3-dimensional polymerization exhibited at least 2 BTA layers on Cu surface. The proposed orientation of the first adsorbed BTA layer on Cu (110) surface is the flat adsorption position based on the atomic scale resolution of STM and thickness dependence of UPS spectra. This adsorption structure and polymerized multilayer film of the BTA blocks the surface completely. Adsorption sites on the copper surface for attacking media are unavailable for oxidation reaction.
- OSTI ID:
- 350164
- Report Number(s):
- CONF-980316--
- Country of Publication:
- United States
- Language:
- English
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