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Corrosion inhibition of cobalt with a thin film of Cu-BTA

Journal Article · · Journal of the Electrochemical Society; (United States)
DOI:https://doi.org/10.1149/1.2220852· OSTI ID:5631029
; ; ;  [1];  [2]
  1. Thomas J. Watson Research Center, Yorktown Heights, NY (United States). IBM Research Division
  2. Univ. of California, Berkeley, CA (United States). Dept. of Chemical Engineering
Electrochemical techniques, ellipsometry and X-ray photoelectron spectroscopy were used to evaluate the use of benzotriazole, alone or in combination with boric acid/borate buffer and dilute copper sulfate for the protection of cobalt. The data indicate that in slightly alkaline solutions benzotriazole is a strong inhibitor for cobalt corrosion, whereas in water and neutral solutions it produces a barely measurable effect. In the presence of benzotriazole and Cu[sup +2] ions, spontaneous reduction of copper ions leads to the formation of a thin film of Cu-BTA on the cobalt surface. This film acts as a corrosion protector that is better than benzotriazole, with a significant reduction of the corrosion rate even during subsequent exposure to solutions without inhibitors.
OSTI ID:
5631029
Journal Information:
Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 140:9; ISSN JESOAN; ISSN 0013-4651
Country of Publication:
United States
Language:
English