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Low-threshold PbEuSeTe double-heterostructure lasers grown by molecular beam epitaxy

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.101743· OSTI ID:6089319

Lattice-matched double-heterostructure (DH) PbEuSeTe lasers were grown by molecular beam epitaxy (MBE) on (100) oriented PbTe substrates. Grooved mesa structures with 17--25 ..mu..m wide stripes and 0.75 ..mu..m thick Pb/sub 1/minus//ital x//Eu/sub /ital x//Se/sub /ital y//Te/sub 1/minus//ital y// active layers with 0less than or equal to/ital x/less than or equal to0.031 were fabricated. DH diode lasers with a PbTe active layer reached a maximum cw operation temperature of 175 K which equals the highest operation temperature achieved so far by a side optical cavity (SOC) single quantum well (SQW) PbTe/PbEuSeTe laser. The threshold current density of 3.9 A/cm/sup 2/ measured for this laser at 15 K is, to our knowledge, the lowest ever published for lead salt lasers. Comparison of MBE-grown DH lasers which utilize the lattice-matched PbTe/PbEuSeTe system to those utilizing the nonlattice-matched PbSe/PbEuSe system shows higher operation temperatures and by far lower threshold currents for the lattice-matched system.

Research Organization:
Laser Photonics, Analytics Division, Bedford, Massachusetts 01730(US)
OSTI ID:
6089319
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 55:1; ISSN APPLA
Country of Publication:
United States
Language:
English