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Submicron NbN Josephson tunnel junctions for digital applications

Conference · · IEEE Trans. Magn.; (United States)
OSTI ID:6087804
Submicron NbN/MgO/NbN Josephson tunnel junctions have been investigated to make Josephson integrated circuits. The junctions have been fabricated successfully by the cross-line-patterning (CLIP) method with an electron-beam (EB) direct-writing technique. All refractory fabrication process for logic circuits using the CLIP method is presented. This process is applied to fabrication of a logic gate of 4JL containing 0.8 ..mu..m-square junctions as an example of digital applications. The logic gate has been fabricated by this process. The authors also discuss the characteristics of the gate.
Research Organization:
Electrotechnical Lab., 1-1-4 Umezono, Tsukuba-shi, Ibaraki (JP)
OSTI ID:
6087804
Report Number(s):
CONF-880812-
Conference Information:
Journal Name: IEEE Trans. Magn.; (United States) Journal Volume: 25:2
Country of Publication:
United States
Language:
English

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