Chemical structure and physical properties of diamond-like amorphous carbon films prepared by magnetron sputtering

Journal Article · Thu Nov 01 04:00:00 EST 1990 · Journal of Materials Research; (USA)

DOI:https://doi.org/10.1557/JMR.1990.2543· OSTI ID:6082939

Cho, N; Krishnan, K M; Veirs, D K; Rubin, M D; Hopper, C B; Bhushan, B ^[1]

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1. Lawrence Berkeley Laboratory, Berkeley, CA (USA) Bogy, D.B. Computer Mechanics Laboratory, Department of Mechanical Engineering, University of California, Berkeley, CA (USA)

Thin films of amorphous carbon (a-C) and amorphous hydrogenated carbon (a-C:H) were prepared using magnetron sputtering of a graphite target. The chemical structure of the films were characterized using electron energy loss spectroscopy (EELS) and Raman spectroscopy. The mass density, hardness, residual stress, optical bandgap, and electrical resistivity were determined, and their relation to the film's chemical structure are discussed. It was found that the graphitic component increases with increasing sputtering power density. This is accompanied by a decrease in the electrical resistivity, optical bandgap, mass density and hardness. Increasing the hydrogen content in the sputtering gas mixture results in decreasing hardness (14 GPa to 3 GPa) and mass density, and increasing optical band gap and electrical resistivity. The variation in the physical properties and chemical structures of these films can be explained in terms of the changes in the volume of sp{sup 2}-bonded clusters in the a-C films and changes in the termination of the graphitic clusters and sp{sup 3}-bonded networks by hydrogen in the a-C:H films.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 6082939
• Journal Information: Journal of Materials Research; (USA), Journal Name: Journal of Materials Research; (USA) Vol. 5:11; ISSN JMREE; ISSN 0884-2914
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360602 -- Other Materials-- Structure & Phase Studies
360603* -- Materials-- Properties
AMORPHOUS STATE
CARBON
CHEMICAL BONDS
DENSITY
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRON SPECTROSCOPY
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTAL MINERALS
ELEMENTS
EQUIPMENT
FILMS
GRAPHITE
HARDNESS
HYDROGEN ADDITIONS
MAGNETRONS
MECHANICAL PROPERTIES
MICROWAVE EQUIPMENT
MICROWAVE TUBES
MINERALS
NONMETALS
PHYSICAL PROPERTIES
RAMAN EFFECT
SPECTROSCOPY
SPUTTERING
STRESSES
THIN FILMS