Influence of temperature on the hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition

Journal Article · Mon Nov 15 04:00:00 EST 2010 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3497025· OSTI ID:22051159

Jiung, Wu; Yilung, Cheng; Shiau, Ming-Kai ^[1]

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1. Department of Electrical Engineering, National Chi-Nan University, Nan-Tou, Taiwan 54561 (China)

Hydrogenated amorphous carbon (a-C:H) films were deposited in a plasma-enhanced chemical vapor deposition (PECVD) system. The substrate temperature at deposition was found to have significant effects on the film stoichiometry, sp{sup 2} phase, and optical properties. Raman spectroscopy reveals an increase in sp{sup 2}-bonded carbon and a continual structure ordering of the sp{sup 2} phase with increasing substrate temperature at deposition. Thermal desorption spectroscopy analysis revealed that the onset temperature of CH{sub 4} effusion of PECVD a-C:H films increase with increasing substrate temperatures, implicating enhanced structural stability via elevating the substrate temperature at deposition. The extinction coefficient k measured from spectroscopic ellipsometry gradually increases with increasing substrate temperature at deposition, due possibly to the graphitization effect which decreases the optical gap resulting in higher k.

• OSTI ID: 22051159
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 6 Vol. 28; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CARBON
CHEMICAL VAPOR DEPOSITION
DESORPTION
ELLIPSOMETRY
GRAPHITIZATION
METHANE
OPTICAL PROPERTIES
PLASMA
RAMAN SPECTRA
RAMAN SPECTROSCOPY
STOICHIOMETRY
SUBSTRATES
TEMPERATURE DEPENDENCE
THIN FILMS