Primary-ion charge neutralization in secondary ion mass spectrometry analysis of insulators

Journal Article · Sat Mar 01 04:00:00 EST 1986 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.336444· OSTI ID:6077047

Inoue, K; Isogai, A

Primary-ion charge neutralization by means of negative ion bombardment, conductive film coating, and conductive layer induced by sputtering has been investigated for the purpose of developing secondary ion mass spectrometry (SIMS) analysis of insulators. It has been found that negative ion bombardment reduces charge accumulation on a specimen, while the conductive film and layer play a subordinate role in charge neutralization. In SIMS analysis of insulators, however, the conductive film is required to provide the extraction field for secondary ions in combination with charge neutralization by negative ion bombardment.

• Research Organization: Toyota Central Research and Development Laboratories, Inc., 41-1 Yokomichi Nagakute, Nagakute-cho, Aichi-gun, Aichi-ken, 480-11, Japan
• OSTI ID: 6077047
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 59:5; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CHALCOGENIDES
COLLISIONS
ELECTRICAL EQUIPMENT
ELECTRICAL INSULATORS
EQUIPMENT
ION COLLISIONS
ION-NEUTRALIZATION SPECTROSCOPY
MASS SPECTROSCOPY
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
QUARTZ
RECOMBINATION
SILICON COMPOUNDS
SILICON OXIDES
SPECTROSCOPY
SPUTTERING