Method of forming thin niobium carbonitride superconducting films of exceptional purity

Patent · Tue Jul 21 04:00:00 EDT 1981

OSTI ID:6065301

Francavilla, T L; Wolf, S A

Thin superconducting NbCn films are deposited by reactive sputtering onto a dielectric substrate inside a vacuum chamber. The substrate is heated to a temperature of 600/sup 0/-1200/sup 0/ C., ultrapure argon is introduced into the chamber, and niobium is presputtered from a high-purity target onto a shutter. A cyanogen and nitrogen gas mixture is introduced into the chamber at a rate of approximately 10-6 torr liters/sec, and a shutter is opened exposing the substrate to the sputtered niobium. The deposited niobium reacts with the cyanogen-nitrogen gas mixture to form NbCn films of exceptional purity, and which exhibit superior superconductor properties.

• Assignee: U S Of America Navy Secretary Of
• Patent Number(s): US 4279969
• OSTI ID: 6065301
• Country of Publication: United States
• Language: English

Related Subjects

420201* -- Engineering-- Cryogenic Equipment & Devices
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON
CYANOGEN
DEPOSITION
DIELECTRIC MATERIALS
ELEMENTS
FILMS
FLUIDS
GASES
HIGH VACUUM
MATERIALS
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
PNICTIDES
RARE GASES
SHUTTERS
SPUTTERING
SUPERCONDUCTING FILMS
SURFACE COATING
SYNTHESIS
TRANSITION ELEMENT COMPOUNDS
VACUUM COATING