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Effect of metal/P-doped a-Si:H junctions on the photovoltage of a-Si:H solar cells

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.339306· OSTI ID:6052050

The open-circuit photovoltages (V/sub oc/) of a-Si:H solar cells having a Glass/TCO/p-i-n a-Si:H/metal structure were examined as a function of the thickness of the n layer. The V/sub oc/ stayed constant at --0.8 V, irrespective of the kind of metals, as far as the thickness of the n layer was larger than 15 nm, but dropped when the n layer got thinner. This effect was the stronger, the smaller the work function of the metal. The decrease of V/sub oc/ is attributed to complete depletion of the n layer, leading to the reduction of the potential gradient in the i layer. The effects of the metal/P-doped a-Si:H junction were further investigated using cells having a Glass/TCO/n-i-n/metal structure and different doping concentrations for the latter n layer. The results obtained supported the above-mentioned conclusion.

Research Organization:
Laboratory for Chemical Conversion of Solar Energy and Department of Chemistry, Faculty of Engineering Science, Osaka University, Toyonaka, Osaka 560, Japan
OSTI ID:
6052050
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 62:8; ISSN JAPIA
Country of Publication:
United States
Language:
English